The drift-diffusion model is a semi-classical description that treats the semiconductor as a continuum. It combines Poisson’s equation for the electrostatic potential, the continuity equations for electrons and holes, and current density expressions writing the electron and hole flows as the sum of a drift term and a diffusion term. Because the three depend on one another, a solution satisfying all of them at once, a self-consistent solution, is found by iteration. Recombination and generation rates enter through the continuity equations.
The formulation was developed to handle numerically the regime where device scaling had made closed-form analytic models untenable. In procedure it is layered: discretize the governing equations, solve the resulting system of nonlinear algebraic equations by iteration, and solve a sparse linear problem inside that.
On the implementation side, the device is divided into an unstructured finite-element mesh and the solution is obtained at each mesh node. The published material does not state which discretization scheme is used for the continuity equations, so this page does not go into the discretization itself.